PT-W ALLOY TESTED AS A THINNER LOW-N ABSORBER FOR HIGH-NA EUV PHOTOMASKS

Summary from the TLDR Hardware newsletter

Researchers at the Chinese Academy of Sciences, Jilin University, and partner labs evaluated a platinum-tungsten alloy as a low-n absorber for EUV photomasks, studying its film properties and imaging performance. Thinner absorbers matter for High-NA EUV because mask 3D effects degrade imaging as features shrink. Thickness and contrast figures are in the iScience paper published in August.