FOUR DECADES OF IN-FAB METROLOGY AND INSPECTION: PIVOTAL MILESTONES AND ROAD AHEAD

Summary from the TLDR Hardware newsletter

Research institute imec published a comprehensive overview detailing four decades of in-fab metrology and inspection evolution across logic transistor scaling roadmaps. The review analyzes four distinct industry eras: predictable happy scaling, initial device material innovations, FinFET architecture transitions, and advanced EUV lithography adoption. As dimensional scaling reaches physical two nanometer limits and artificial intelligence workloads require 3D system stack integration, imec presents a forward-looking metrology framework combining specialized hardware sensor extensions with data-driven inspection algorithms to ensure manufacturing yield and process sustainability.